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1 газофазное химическое осаждение
= химическое осаждение из паровой фазы, CVD-процессua\ \ [lang name="Ukrainian"]газофазне хімічне [осадження], хімічне осідання [осадження] з парової фази, CVD-процесen\ \ [lang name="English"]chemical vapour deposition, CVD-process, chemical vapourplating, gas plating, thermochemical platingde\ \ [lang name="German"]chemische Abscheidung aus der Gasphase, CVD-Prozeß, CVD-Verfahrenfr\ \ \ procédé CVDметод нанесения покрытий путем конденсации на подложке продуктов химических реакций, протекающих в газах, и (или) путем химического взаимодействия между газовой фазой и подложкойТерминологический словарь "Металлы" > газофазное химическое осаждение
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2 процесс химического осаждения из газовой фазы
1) Engineering: CVD process2) Makarov: chemical vapor deposition process (CVD process)Универсальный русско-английский словарь > процесс химического осаждения из газовой фазы
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3 осаждение из парогазовой фазы
= нанесение покрытий из парогазовой фазыua\ \ [lang name="Ukrainian"]осадження з парогазової фази, нанесення покриттів з парогазової фазиen\ \ [lang name="English"]chemical vapour deposition, CVD-process•Терминологический словарь "Металлы" > осаждение из парогазовой фазы
См. также в других словарях:
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LOCOS — LOCOS, short for LOCal Oxidation of Silicon, is a microfabrication process where silicon dioxide is formed in selected areas on a silicon wafer having the Si SiO2 interface at a lower point than the rest of the silicon surface.This technology was … Wikipedia
